Planar Alloy Sputtering Target

Planar Alloy Sputtering Target

Excellent properties such as high purity, high density, Good composition uniformity, Uniform grain, etc.

High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.We have various purity levels to suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals. Also have controlled specific impurities within the target

High density: Metal targets have high density characteristics, usually up to 99%, to ensure the stability and quality of materials.

Uniform grain: Controlled grain size and direction

Good composition uniformity: the component distribution is uniform, ensure the film formation rate is uniform, film quality.

* Maximum sizes of planar target    

Thickness: 30mm (can be 60mm for round target)    

Width: max 2000mm    

Length: max 4000mm    

* Maximum sizes of rotary target    

Vacuum/Air Spraying    

Backing tubes: ID56 x OD64 x Length300~3000mm, Thickness: 3~5mm    

Backing tubes: ID78~83 x OD89~92 x Length300~3000mm, Thickness: 3~7mm    

Backing tubes: ID100 x OD108 x Length300~3000mm, Thickness: 3~8mm    

Backing tubes: ID125 x OD133 x Length300~4000mm, Thickness: 3~13mm    

Bonding    

Backing tubes: ID125 x OD133 x Length500~4000mm, Thickness: 8~13mm    

* Planar/Rotary target can be customised as per your request.    

Alloy sputtering targets play a crucial role in thin film deposition processes, enabling the fabrication of coatings with specific properties tailored to the requirements of diverse applications in industries such as electronics, optics, and coatings.If you need any information or a quote please contact us, you can contact our sales team directly or fill out the form below and we will get back to you in time.